Presentation Profile
Analysis of Trace Metals in Neat 1-Methyl -2- Pyrrolidone (NMP) using the Agilent 5800 ICP-OES System
Currently Scheduled: 10/15/2024 - 1:20 PM - 1:50 PM
Room: Floral Hall A1
Main Author
Paul Krampitz - Agilent Technologies, Inc.
Abstract:
NMP is a versatile polar solvent and has been used in many different industries and applications. Of its many uses, some of the main applications are in the petrochemical industry to recover 1,3 butadiene and acetylene during the processing of petrochemicals. Lithium ion battery fabrication uses NMP to dissolve the polyvinylidene difluoride (PVDF) binder from the electrode to allow the PVDF to evenly coat the electrode. NMP is an excellent dispersant for this industry. NMP is also used widely in the semiconductor industry as a degreaser, photoresist stripper and to treat phenolic die coat resins. Different grades of NMP require different techniques for analysis. For example, SP and semiconductor grade NMP require contaminants to be under 50 ppt for 32 certified metals. This application requires, ideally, an Agilent ICPMS Triple Quadrupole to reach these levels. However electronic grade NMP has a specification of 50 ppb maximum, levels that can be reached using the Agilent 5800 ICP-OES system.
This application will take advantage of the 5800s ability to run NMP without dilution (neat) to improve the overall detectability coupled with removing the structured background of the solvent, resulting in higher S/N ratios and lower detection limits. Paper with include setup, parameters, an MDL study, long term stability study and spike recoveries of known intermediate standards.
